| abstract |
There is no problem in safety, the sensitivity, the resolution, the storage stability as a solution, etc. are excellent, and the development process has a good development margin that can form a good pattern shape even if the optimum development time is exceeded. A radiation-sensitive resin composition and a method for forming an interlayer insulating film and a microlens from the composition are provided. The radiation-sensitive composition comprises (a1) at least one selected from unsaturated carboxylic acids and unsaturated carboxylic anhydrides, (a2) specific oxetane group-containing unsaturated compounds, and (a3) It contains a copolymer of an unsaturated compound having a specific ether structure, and [B] 1,2-quinonediazide compound. [Selection figure] None. |