http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007090681-A

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classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L67-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04
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filingDate 2005-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b760d16ed45d30c28584363b74f332ea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54c25e5f6ea55d4174e734f7c5efdea4
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publicationDate 2007-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007090681-A
titleOfInvention Gas barrier film and method for producing the same
abstract 【Task】 The present invention is intended to provide a gas barrier film having a high gas barrier property at low cost and a method capable of easily and stably producing such a gas barrier film. [Solution] The gas barrier film of the present invention is a film having an inorganic compound layer on a polymer film, and the ratio of the O atom concentration to the Al atom concentration in the inorganic compound layer measured by X-ray photoelectron spectroscopy is 2 to 2. 3. The C atom concentration in the inorganic compound layer measured by SIMS is 1 × 10 21 to 1 × 10 22 atoms / cc. In the method for producing such a gas barrier film, after unwinding the polymer film and then vaporizing the metal to form an inorganic layer on the film surface, the inorganic layer is introduced at the time of forming the inorganic layer. It is characterized by being formed in a carbon element-containing gas plasma atmosphere that is 0.1 to 10% of the number of carbon atoms with respect to the number of oxygen atoms. [Selection] Figure 1
priorityDate 2005-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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