http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007088256-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2005-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_963b2468f8078b40ee1a5d8c571bd978 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_419b6f53b057032a545e4c4e494728b3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f27c45d1ee8ae6ca1ffe36bf23b129fd |
publicationDate | 2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2007088256-A |
titleOfInvention | Pattern forming method and semiconductor device manufacturing method |
abstract | PROBLEM TO BE SOLVED: To effectively remove unreacted photoacid generator and acid trapping agent segregated in a watermark region in immersion exposure, and to suppress development defects and dimensional accuracy deterioration. In a pattern forming method, after a chemically amplified resist film 13 is formed on a substrate 11, a first chemical solution is formed between the chemically amplified resist film 13 and the projection optical system, and then the first chemical solution is formed. A latent image having a desired pattern is formed on the resist film 13 in a state where the chemical solution is formed, and then the resist film 13 is not dissolved in the resist film 13 and the unreacted photoacid generator and the resist film 13 are not dissolved. A second chemical solution made of an organic solvent capable of dissolving the acid trapping agent is supplied, and then the resist film 13 is subjected to heat treatment, and thereafter the resist film 13 is subjected to development processing. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010128056-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007173274-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8349549-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4746979-B2 |
priorityDate | 2005-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.