http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007088256-A

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Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
filingDate 2005-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_963b2468f8078b40ee1a5d8c571bd978
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_419b6f53b057032a545e4c4e494728b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f27c45d1ee8ae6ca1ffe36bf23b129fd
publicationDate 2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007088256-A
titleOfInvention Pattern forming method and semiconductor device manufacturing method
abstract PROBLEM TO BE SOLVED: To effectively remove unreacted photoacid generator and acid trapping agent segregated in a watermark region in immersion exposure, and to suppress development defects and dimensional accuracy deterioration. In a pattern forming method, after a chemically amplified resist film 13 is formed on a substrate 11, a first chemical solution is formed between the chemically amplified resist film 13 and the projection optical system, and then the first chemical solution is formed. A latent image having a desired pattern is formed on the resist film 13 in a state where the chemical solution is formed, and then the resist film 13 is not dissolved in the resist film 13 and the unreacted photoacid generator and the resist film 13 are not dissolved. A second chemical solution made of an organic solvent capable of dissolving the acid trapping agent is supplied, and then the resist film 13 is subjected to heat treatment, and thereafter the resist film 13 is subjected to development processing. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010128056-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007173274-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8349549-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4746979-B2
priorityDate 2005-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID702
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3283
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7910
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419538410
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512377
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11729320
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448674543

Total number of triples: 27.