http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007086372-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2005-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad9bf50d1f42b1c0c557fa66a8b50d1d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0edd39870ab4a302d7e66d720e93eb2c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d11e86da5c7ac12356535350385a40ed |
| publicationDate | 2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007086372-A |
| titleOfInvention | Permanent pattern forming method |
| abstract | A permanent pattern such as a protective film, an interlayer insulating film, and a solder resist pattern can be produced with high definition and efficiency by improving exposure performance without increasing the cost of the apparatus or lowering the exposure speed. Provided is a method for forming a permanent pattern. A light modulating unit that receives light from a light irradiating unit and modulates the light based on pattern information is modulated on the photosensitive layer 12 and modulated by the light modulating unit. Exposure is performed by forming an image on the exposed surface of the photosensitive layer 12 via an imaging means and a focus adjustment means, and the exposure is modulated by the light modulation means. The light is imaged only in a substantially rectangular region 81T including the central portion of the imaging means, and the short side direction of the substantially rectangular shape 81T is directed toward the waviness direction of the photosensitive layer 12. Is a permanent pattern forming method. [Selection] Figure 17A |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022220211-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009157225-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009288301-A |
| priorityDate | 2005-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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