http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007067143-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ed0897e087fa147bc2eb075dbc8b9c1 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2005-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d060ef80aaea4c2c07322c206e94dc16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a3cd01661578f3003942688d541db73 |
| publicationDate | 2007-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007067143-A |
| titleOfInvention | Photosensitive resin composition for polishing pad |
| abstract | [PROBLEMS] To provide a high polishing rate that is less affected by the conditioning conditions and is stable over time and is more resistant to wear than conventional polishing pads. Providing polishing pads with low performance variation. In particular, a polishing pad having a high leveling ability suitable for polishing a thick conductor pattern such as a copper wiring pattern or an aluminum wiring pattern of a damascene wiring is provided. A thermoplastic resin to which a photopolymerizable functional group is added is 10 to 59.9% by mass, a photopolymerizable monomer is 30 to 79.9% by mass, a photopolymerization initiator is 0.1 to 10% by mass, And the polishing pad which consists of hardened | cured material of the photosensitive resin composition which contains 1-29.9 mass% of organic polymer microparticles | fine-particles which do not raise | generate substantially a melt | dissolution and swelling even if it contacts either a monomer and water. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170096113-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102438955-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018502452-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012182314-A |
| priorityDate | 2005-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 65.