http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007066929-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-148
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filingDate 2005-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc601cb0260b292ab03c64daf258f220
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07b235b04330fa1772023fcd455cd5ae
publicationDate 2007-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007066929-A
titleOfInvention Solid-state imaging device
abstract A solid-state imaging device capable of suppressing the occurrence of charge transfer failure is provided. In this solid-state imaging device, a transfer area 8 on an imaging unit 1 formed on an n-type silicon substrate 11 located between two adjacent pixel separation areas 7 and between two adjacent pixel separation areas 7 are provided. A transfer region 9a in the vicinity of the boundary formed so as to be adjacent to the transfer region 8 on the imaging unit 1 side in the electron transfer direction, and the transfer region 8 on the imaging unit 1 side. And a transfer electrode 16b formed on the transfer region 9a near the boundary. Further, in the charge transfer path toward the transfer area 9a of the storage portion 2 side from the n + -type impurity regions 14a of the imaging unit 1 side of the transfer area 8, the n + -type impurity regions 14a of the imaging unit 1 side of the transfer area 8 one An n-type impurity region 13 having an n-type impurity concentration lower than that of the n + -type impurity region 14a of the transfer region 8 on the imaging unit 1 side is formed in the transfer region 9a on the storage unit 2 side corresponding to the part. [Selection] Figure 3
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010109196-A
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