http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007065337-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2005-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56516dd21de0079cd1bd0118487c717f |
| publicationDate | 2007-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007065337-A |
| titleOfInvention | Positive resist composition and pattern forming method using the same |
| abstract | PROBLEM TO BE SOLVED: To provide a positive resist composition having improved line edge roughness and pattern profile even in the formation of a fine pattern of 100 nm or less, and a pattern forming method using the same. (A) a resin whose solubility in an alkaline developer is increased by the action of an acid; (B) a compound that generates an acid upon irradiation with actinic rays, and (C) A positive resist composition containing a tertiary amine compound represented by the general formula (I). (R 1 ) (R 2 ) N—X—CN (I) In the general formula (I), X represents a divalent aliphatic group, R 1 represents a monovalent aliphatic group, and R 2 represents an aromatic group. R 1 and R 2 may be combined to form a ring with the nitrogen atom to which they are bonded. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012181306-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021131522-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016181722-A1 |
| priorityDate | 2005-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 351.