| abstract |
PROBLEM TO BE SOLVED: To provide a film forming composition capable of obtaining a pattern with enhanced contrast due to unevenness of a film after development, a pattern forming method using the same, and a three-dimensional mold. A compound capable of controlling the solubility of a formed film in a developer in response to light and / or heat is a hydrolyzate of an alkoxy metal compound represented by the following chemical formula (A) and / or Or it mix | blends with the composition containing a condensate. [Chemical 1] (Where M is silicon, germanium, titanium, tantalum, indium or tin; R 1 is a hydrogen atom or a monovalent organic group, R 2 is a monovalent organic group, n shows the integer of 1-3. ) [Selection figure] None |