Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d72339a6b893476ba374b394b9685349 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3222 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-721 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-723 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6567 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-656 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-652 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-9607 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-602 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-85 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-80 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-62675 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-581 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-638 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-6303 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-638 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-581 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-15 |
filingDate |
2006-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc24b2a656ef43618bb0f698609498bd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f23d5721de295b02096ee0589bc5e7d |
publicationDate |
2007-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2007063122-A |
titleOfInvention |
Semiconductor device substrate |
abstract |
A semiconductor device substrate having high thermal conductivity and excellent heat dissipation is provided. A ratio of X-ray diffraction intensity IAl 2 Y 4 O 9 of Al 2 Y 4 O 9 (201 plane) to X-ray diffraction intensity IAlN of aluminum nitride (101 plane) (IAL 2 Y 4 O 9 / IALN). Is a substrate for a semiconductor device, characterized by comprising an aluminum nitride sintered body having a thermal conductivity of 220 W / m ยท K or more and a three-point bending strength of 250 MPa or more. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010215465-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011037691-A |
priorityDate |
2003-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |