http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007059324-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M14-00
filingDate 2005-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd5852efdbfe5a965dd83393e04e95ae
publicationDate 2007-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007059324-A
titleOfInvention Method for forming dye-sensitized semiconductor electrode and photovoltaic module
abstract PROBLEM TO BE SOLVED: To provide a method for forming a dye-sensitized semiconductor electrode excellent in mass productivity. A method of forming a dye-sensitized semiconductor electrode on an electrode pattern 22 in which a hot melt layer 8 is covered with a coating layer 4 made of a metal material and has an opening 32a penetrating the front and back surfaces. The step of thermocompression bonding the formation mask 30a to the substrate 20 on which the electrode pattern 22 is formed so that the opening 32a and the electrode pattern 22 are aligned, and the opening 32a is filled with a semiconductor electrode material A step of supporting the photosensitizing dye on the semiconductor electrode material 34b filled in the opening 32a, and a step of peeling the semiconductor electrode formation mask 30a. [Selection] Figure 4
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008243425-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014030736-A1
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