| abstract |
Disclosed is a radiation-sensitive resin composition that is a resist that is excellent in sensitivity and resolution, has a small line edge roughness of a pattern, and can maintain a good pattern shape. A radiation sensitive composition comprising (A) an acid-dissociable group-containing copolymer containing an alkyl-substituted norbornanelactone ring, (B) a sulfonic acid ester-type acid proliferating agent, and (C) an acid generator. Resin composition. [Selection figure] None |