Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f5260a44f98154394a4fa1d69a8ec3c |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-447 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2005-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94348afa32aa10b8b9fa2156c8ce1a88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03c5b30d0be720cf1c8f50c8ed8c4e81 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b214bfe4e1d892586d4d4773200050f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cd232db80e93bc752c0e0c73df6e4dd |
publicationDate |
2007-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2007052151-A |
titleOfInvention |
Chemically amplified positive resist composition for electrophoresis apparatus |
abstract |
The present invention provides a chemically amplified positive resist composition for an electrophoretic device that does not cause rough etching surfaces and has excellent pattern controllability. (A) General formula (I) [Wherein R 1 to R 3 represent alkyl, aryl or aralkyl], (B) a compound capable of generating an acid upon irradiation with radiation, and (C) an organic solvent. contains. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013137537-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013029687-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102902157-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101605225-B1 |
priorityDate |
2005-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |