http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007048742-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa02ac849c15b231a0486f7404fdcf61 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-68 |
| filingDate | 2006-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66d3f2c7b2b0e0dd8e69fdd32f99f41d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8866ac9b5cb0cf83cb35b953ca9feda http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18d0b5f8d88c810a883e7b77e821d552 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8b164373aa116982482ab99563e4d0d |
| publicationDate | 2007-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007048742-A |
| titleOfInvention | Inductively coupled plasma alignment apparatus and method |
| abstract | There is provided an inductively coupled plasma (ICP) aligning device which can suppress RF radiation without moving a bulky and heavy RF electronic circuit and has a small adjustment width for impedance matching. The position of the torch 20 relative to the coil 10 is changed so that the arrangement of the coil 10 for generating ICP in the gas, the torch 20 partly or entirely inside the coil 10 and the torch shaft 200 relative to the coil shaft 100 is changed. The ICP aligning device is configured by the adjusting mechanism 80 which is a means for adjusting the above. The adjustment mechanism 80 adjusts the angle and / or distance between the coil shaft 10 and the torch shaft 200, and adjusts the distance between the torch shaft 200 and the coil shaft 100 while keeping the torch shaft 200 substantially parallel to the coil shaft 100. . The position of the coil 10 is substantially fixed with respect to the aperture for sampling ICP-derived photons or ions. [Selection] Figure 5 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106604512-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11178748-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016164894-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010197080-A |
| priorityDate | 2005-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.