http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007046144-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f017de30242de1c99ace84ba61e5d5d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_31aee36db8030bdf89fb1dcdd82c81f9 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-22 |
| filingDate | 2005-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b6fa38a02a328ac0d3dedc63f959884 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83c2bee509bab1186226acd49a1a821f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccb16770fc1ef4da981347617ffd5560 |
| publicationDate | 2007-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007046144-A |
| titleOfInvention | Plasma surface treatment method, plasma treatment apparatus and object |
| abstract | [Objective] A plasma surface treatment method, a plasma treatment apparatus, and a plasma treatment method for forming a single film, a mixed film, and a laminated film smoothly with high purity without being affected by droplets, partially using vacuum arc plasma The target object processed using these is provided. [Structure] Two kinds of first plasma 16 and second plasma 17 are used. Each plasma is a vacuum arc plasma generated by performing a vacuum arc discharge in an arc discharge unit set in a vacuum atmosphere in the first plasma generation unit 2 and the second plasma generation unit 3, and the first and second plasmas are introduced. It is introduced into the common transport duct 10 via the paths 22 and 23. At this time, the timing at which the first and second plasmas 16 and 17 are introduced into the common transport duct 10 is controlled, and surface treatment processing such as formation of a laminated film is performed on the surface of the workpiece W in the plasma processing unit 1. The plasma introduction angle of each plasma introduction path is set to an acute angle with respect to the transport direction of the common transport duct 10. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102102178-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103459652-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011122662-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8728621-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010001501-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008223105-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016037637-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010050542-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012067352-A |
| priorityDate | 2005-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.