| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-24 |
| filingDate |
2005-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f01d90d59abaf51b0aa76dc7fb981dd4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c12cee763db29fa152edc93ce28ca8c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf58444c2649cb9ce86bc0ac39fc8840
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3415c2eb118e2ce0275b27e2868f72bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4566e477ce3657aab1dde528ff23a26d |
| publicationDate |
2007-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2007042395-A |
| titleOfInvention |
Method for forming inorganic layer, resin composition, film element, laminate, front substrate for plasma display panel and plasma display panel |
| abstract |
PROBLEM TO BE SOLVED: To provide a method for forming an inorganic layer capable of forming an inorganic layer having a predetermined uneven pattern with sufficiently high accuracy even by one firing. A first layer forming step of forming a first layer made of a first resin composition containing a polymer having a reactive double bond, a thermosetting agent, and inorganic particles on a substrate; A second layer forming step of forming a second layer 61 made of a photosensitive second resin composition containing inorganic particles on the surface of the first layer 21 opposite to the substrate 40; An exposure process in which the pattern is exposed, a resist layer forming process in which the second layer 61 is developed after the exposure process to form the resist layer 62 having the pattern, and the resist layer 62 is baked together with the first layer 21. And a firing step for forming the inorganic layer 70. [Selection] Figure 3 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019064970-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2019064970-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7022141-B2 |
| priorityDate |
2005-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |