http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007021704-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2005-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3995abb5ee8241384adf16b81b65820c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5a297b3bed0dddb12f66b9f25cd93a5 |
| publicationDate | 2007-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007021704-A |
| titleOfInvention | Polishing composition and polishing method |
| abstract | PROBLEM TO BE SOLVED: To provide a polishing composition capable of suitably polishing a (0001) Si face and a (000-1) C face and a polishing method using such a polishing composition. The polishing composition of the present invention is mainly used for polishing a polishing object composed of a silicon carbide single crystal, and comprises abrasive grains such as colloidal silica, orthoperiodic acid and meta Contains iodine compounds such as sodium periodate. The polishing composition has a pH of 6-8. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010182782-A |
| priorityDate | 2005-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.