http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007005731-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2005-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db711e84ab4119c5ec9d4a2b99d2bc3d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f7ca320ace9f4d176b2a7c921206ff0 |
| publicationDate | 2007-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007005731-A |
| titleOfInvention | Liquid for immersion exposure and purification method thereof |
| abstract | PROBLEM TO BE SOLVED: To suppress a pattern shape deterioration and form a pattern with better resolution and depth of focus when used as a liquid for immersion exposure because it has a high refractive index and transmittance in the far ultraviolet region. A liquid used in an immersion exposure apparatus or an immersion exposure method in which exposure is performed through a liquid filled between a lens of a projection optical system and a substrate, the liquid having an average particle diameter of 1 mm or less. It is refined using sulfuric acid in the form of fine droplets, and the transmittance per 1 mm of the optical path length at 193 nm is 97% or more. [Selection] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4821776-B2 |
| priorityDate | 2005-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.