http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007005571-A

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filingDate 2005-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b68b284a3c7e4a04d1207cebd28d9ef
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publicationDate 2007-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007005571-A
titleOfInvention Exposure apparatus and device manufacturing method
abstract Deterioration of optical characteristics of an optical system containing a liquid is suppressed and high-precision exposure is realized. A main controller controls current supply to a plurality of Peltier elements in accordance with an irradiation state of illumination light IL, and adjusts (manages) the temperature of at least a part of a liquid Lq2. Even if it changes, the temperature of the liquid Lq2 can be maintained in a desired state. Thereby, it is possible to suppress the deterioration of the optical characteristics of the optical system including the liquid due to the change in the temperature of the liquid Lq2, and it is possible to perform highly accurate exposure. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015515738-A
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