http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006513455-A

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
filingDate 2003-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2006-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006513455-A
titleOfInvention Silicon-containing resist composition and method of forming patterned material on a substrate (low silicon outgassing resist for two-layer lithography)
abstract A silicon-containing resist formulation that reduces or eliminates silicon outgassing is provided. A silicon-containing resist composition having low silicon outgassing and high resolution lithographic performance, particularly in two-layer or multi-layer lithography applications using imaging radiation with a wavelength of 193 nm or less, contained silicon. This is made possible by the presence of an imaging polymer having pendant groups that are not acid labile. Preferably, the resist composition of the present invention is further characterized in that it contains silicon and is substantially free of acid-labile moieties.
priorityDate 2002-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410493960
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23515
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6581
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419571081
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415711389
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419515534
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15321490
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID161270289
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426248986
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526573
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474382
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419513873
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9638
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8227
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474364
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11390128
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457380126
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3868826
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10329681
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559542
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7923
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419519445
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413304127
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17764267
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2758875
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450106520
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410503276
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6325
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456171974
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID67815
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID74483
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523914
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID428402573
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21960938
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21863819
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID86175481
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16760155
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID71317285
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420120252
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10935
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID421469809
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558839
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420260353
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1057
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453280928

Total number of triples: 67.