http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006512600-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
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filingDate 2002-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2006-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006512600-A
titleOfInvention Highly sensitive resist composition for electron-based lithography
abstract PROBLEM TO BE SOLVED: To provide a resist composition having an acid-sensitive imaging polymer and a radiation-sensitive acid generator component. The present resist composition comprises: (I) a first radiation sensitive acid generator selected from the group consisting of dissolution inhibiting acid generators; (Ii) a second radiation sensitive acid generator selected from the group consisting of an unprotected acidic group-functionalized acid generator and an acid labile group protected acidic group-functionalized radiation sensitive acid generator When, And enables the formation of highly sensitive resists suitable for use in EPL, EUV, soft x-ray and other low energy intensity lithographic imaging applications. The resist composition is also useful for other lithography methods.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8771923-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5267126-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8361691-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008029673-A1
priorityDate 2002-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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