| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2043-025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2059-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2035-0827 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C43-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C35-0888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C35-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2003-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2006-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2006509354-A |
| titleOfInvention |
Polymer solution for nanoimprinting lithography to reduce imprint temperature and pressure |
| abstract |
A method is provided for forming a contour on a substrate (10) by imprinting. The method includes: (a) forming a polymer solution in which at least one polymer is dissolved in at least one polymerizable monomer; and (b) depositing the polymer solution on a substrate (10); Forming a liquid film (12) thereon; and (c) curing the liquid film (12) by polymerization of monomers and optionally cross-linking of the monomers to produce a glass transition temperature (Tg) Forming the polymer film (12 ′) and imprinting the polymer film (12 ′) with the mold (16) having the desired pattern (16a), the corresponding negative pattern (12a) is formed into the polymer film (12 ′). Or (d) Imprinting the liquid film (12) using the mold (16) and curing it to form a polymer film (1) having a negative pattern (12a) Encompasses, to form a '). The imprint temperature may be as much as 10 ° C. above the Tg or even lower if the membrane (12) is a liquid membrane. The imprint pressure (20) can be 100-500 psi. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011181704-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013136858-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006114882-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010541193-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013189537-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9376581-B2 |
| priorityDate |
2002-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |