| abstract |
[Problem] To provide a skin cleansing composition which can be sufficiently massage-washed by slipping liquid with less foaming and moisturizes the skin after washing. (A) Polyoxyethylene alkyl ether anionic surfactants such as polyoxyethylene alkyl ether phosphate, polyoxyethylene alkyl ether acetate, polyoxyethylene alkyl ether sulfate, etc. (B) 30 to 80% by mass of a polyol, (C) 0.01 to 3% by mass of a water-soluble polymer compound and (D) a skin cleanser composition containing water. Further, a cleaning agent containing 0.5 to 5% by mass of component (E) amphoteric surfactant and 1 to 10% by mass of component (F) trimethylglycine. [Selection figure] None |