| abstract |
[PROBLEMS] To provide a radiation-sensitive resin composition capable of forming a microlens excellent in film thickness, resolution, pattern shape, heat resistance, transparency, heat discoloration resistance, solvent resistance, etc., and having excellent storage stability. To do. The radiation-sensitive resin composition comprises (A) (a) 10 to 50% by weight of a polymerizable unsaturated compound having an acidic functional group, (b) an alicyclic hydrocarbon group, and an acidic functional group. 20 to 60% by weight of a polymerizable unsaturated compound not having the above and (c) 5 to 40% by weight of another polymerizable unsaturated compound (provided that (a) + (b) + (c) = 100% by weight) An alkali-soluble copolymer obtained by polymerization, (B) a polymerizable unsaturated compound having an alicyclic hydrocarbon group and a polymerizable unsaturated compound having no acidic functional group as an essential component, and (C ) A photopolymerization initiator is contained. [Selection figure] None |