| abstract |
PROBLEM TO BE SOLVED: To provide excellent releasability of a photoresist layer provided on a substrate formed with both a metal wiring and an inorganic material layer (polysilicon film, etc.) and excellent corrosion resistance of an inorganic material layer (polysilicon film, etc.). A cleaning solution for photolithography that does not cause discoloration of the stripping solution and is easy to manage and does not cause deposits on the substrate, and a substrate processing method using the same. (A) a nitro compound containing a fluorine group (for example, p-fluoronitrobenzene), (b) a water-soluble alkali compound (for example, tetramethylammonium hydroxide), (c) water, and (d) A cleaning liquid for photolithography containing a water-soluble organic solvent (for example, dimethyl sulfoxide), and a substrate processing method using the same. [Selection figure] None |