| abstract |
It is possible to reduce plating unevenness and stains in the electroplating process during pattern exposure, development and further electroplating on a silver halide photosensitive material, thereby achieving uniform, high conductivity and high translucency. A conductive film, particularly an electromagnetic wave shielding film, is provided. A black and white silver halide photographic light-sensitive material having at least one hydrophilic colloid layer including a silver halide emulsion layer on a support is subjected to a development treatment to form a metallic silver portion, and then the metallic silver. In the method for producing a conductive film in which the part is subjected to electrolytic plating, pretreatment is performed with an aqueous electrolyte solution before the plating solution treatment. [Selection figure] None |