http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006330180-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-282 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 |
| filingDate | 2005-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_368f3adf309874820f1cd2166e6641b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3459cb5cc8b4d592db3bdd04ae5cf7d2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0404f734ae876eb23bfedabca2abc0c7 |
| publicationDate | 2006-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006330180-A |
| titleOfInvention | Positive type photoresist composition, thick film photoresist laminate, method for producing thick film resist pattern, and method for producing connection terminal |
| abstract | PROBLEM TO BE SOLVED: To provide a positive photoresist composition capable of obtaining high sensitivity in the formation of a thick film resist pattern. SOLUTION: (A) a compound that generates an acid upon irradiation with actinic rays or radiation, and (B) a resin whose solubility in alkali is increased by the action of the acid, wherein the component (B) is acrylic acid A resin (B1) having a structural unit (b1) derived from an ester, wherein a hydrogen atom of a carboxy group is substituted with an acid dissociable, dissolution inhibiting group represented by the following general formula (I) A positive photoresist composition comprising: a positive photoresist composition; [Chemical 1] [Wherein Y represents an optionally substituted aliphatic cyclic group or an alkyl group; n represents 0 or an integer of 1 to 3; and R 1 and R 2 each independently represent hydrogen. Represents an atom or a lower alkyl group having 1 to 5 carbon atoms. ] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008191218-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013210619-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017027039-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017021345-A |
| priorityDate | 2005-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 326.