| abstract |
An ester compound represented by the following general formula (1). Embedded image (In the formula, R 1 represents a fluorine atom or a linear, branched or cyclic fluorinated alkyl group having 1 to 10 carbon atoms. R 2 represents a linear, branched or cyclic group having 1 to 10 carbon atoms. And R 3 represents an acid labile group.) [Effect] The resist material using the polymer compound obtained from the polymerizable ester compound of the present invention has excellent resolution and transparency in ArF exposure, small line edge roughness, excellent etching resistance, especially the surface after etching. The roughness is small. Further, ArF immersion lithography that performs exposure by inserting a liquid between the projection lens and the wafer can exhibit the same high performance. [Selection figure] None |