http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006317583-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2005-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58a5fc56afea2904e048289a017ae35e |
| publicationDate | 2006-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006317583-A |
| titleOfInvention | Negative resist composition and method for forming resist pattern for manufacturing MEMS (Micro Electro Mechanical Systems) |
| abstract | PROBLEM TO BE SOLVED: To provide a negative resist composition and a resist pattern forming method which are capable of forming a high resolution resist pattern excellent in plating resistance and are preferably used for producing MEMS. A negative resist composition for producing MEMS, comprising an alkali-soluble novolak resin (A), an acid generator component (B) that generates acid upon irradiation with radiation, and a crosslinking agent component (C). . [Selection figure] None |
| priorityDate | 2005-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 274.