| abstract |
The present invention provides a useful manufacturing method for obtaining a hard coating for a cutting tool that is capable of high-speed and high-efficiency cutting and has better wear resistance than TiAlN. A method for producing a hard film having a predetermined composition and crystal structure, wherein the target is evaporated in an arc ion plating method in which the metal constituting the target is evaporated and ionized by arc discharge. A magnetic field line that diverges forward or travels substantially perpendicular to the surface is formed. This magnetic field line promotes the plasma formation of the film forming gas in the vicinity of the object to be processed, and the bias potential applied to the object to be processed is a ground potential. The film is formed at -50V to -300V. [Selection] Figure 1 |