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filingDate 2006-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d59d756b717b2fe49bc57d53e89022ec
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publicationDate 2006-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006313899-A
titleOfInvention Image sensor and manufacturing method thereof
abstract An image sensor and a CMOS image sensor in which the occurrence of random noise is sufficiently reduced are provided. An image sensor includes a photodiode formed downward from a substrate surface in a plate thickness direction, and a gate structure formed on a surface side of the substrate on which the photodiode is formed. The gate structure includes a gate insulating film made of an oxide not containing nitrogen and a gate conductive film formed on the gate insulating film. A nitride region is formed on the surface of the gate insulating film in contact with the gate conductive film. Therefore, the random noise characteristic of the image sensor and the threshold voltage characteristic due to the boron penetration phenomenon can be easily improved. [Selection] Figure 2
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10490582-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017118121-A
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priorityDate 2005-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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