http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006309051-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2005-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58a5fc56afea2904e048289a017ae35e |
| publicationDate | 2006-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006309051-A |
| titleOfInvention | Positive resist composition and resist pattern forming method used in the exposure process using at least two kinds of exposure light sources selected from g-line, i-line, KrF excimer laser and electron beam |
| abstract | PROBLEM TO BE SOLVED: To perform exposure using at least two kinds of exposure light sources selected from g-line, i-line, KrF excimer laser and electron beam having sensitivity to g-line, i-line, KrF excimer laser and electron beam. Provided are a positive resist composition and a resist pattern forming method that can be used in the process. A positive resist composition used in an exposure process using at least two kinds of exposure light sources selected from g-line, i-line, KrF excimer laser and electron beam, comprising an acid dissociable, dissolution inhibiting group. And a resin component (A) whose alkali solubility is increased by the action of an acid, and an acid generator component (B) that generates an acid upon irradiation with g-line, i-line, KrF excimer laser and electron beam. A positive resist composition characterized by the above. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2993521-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10007181-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008134515-A |
| priorityDate | 2005-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 248.