| abstract |
PROBLEM TO BE SOLVED: To provide an imaging system capable of simultaneously displaying an image of an entire edge of a semiconductor wafer over an azimuth angle of 180 ° on a monitor. In the present invention, a light source device (1, 2, 3) that generates a line-shaped light beam, an objective lens (10) that focuses the line-shaped light beam and projects it onto a sample, and a linear image sensor (13). 3), the wafer edge is scanned three-dimensionally, and the wafer edge is imaged from a plurality of angular directions. In the signal processing circuit (16), a plurality of images taken from a plurality of angles are combined and displayed on the image display device (16). Furthermore, in the present invention, since the wafer edge is scanned three-dimensionally, an image of the wafer edge can be displayed three-dimensionally using height information in the depth direction. [Selection] Figure 1 |