| abstract |
[PROBLEMS] To provide particularly excellent exposure sensitivity, small surface tackiness, good laminating and handling properties, excellent storage stability, excellent plating resistance, chemical resistance, surface hardness, heat resistance, etc. after development. Provided are a photosensitive composition that develops, a photosensitive film using the same, a high-definition permanent pattern, and an efficient formation method thereof. A photosensitive composition comprising at least an alkali-soluble copolymer, a polymerizable compound having at least one vinyl group having a substituted methyl group at the α-position, a photopolymerization initiator, and a thermal crosslinking agent, It is the photosensitive film using this, a permanent pattern, and its formation method. In particular, an embodiment in which the polymerizable compound includes at least a structure represented by the following general formula (1) is preferable. [Selection figure] None |