| abstract |
PROBLEM TO BE SOLVED: To provide a composition for forming a silica-based film that can form a silica-based film having a low dielectric constant, good electrical characteristics, and good film thickness uniformity. A composition for forming a silica-based film includes a siloxane polymer, an alkali metal compound, and a pore-forming material. As this siloxane polymer, a hydrolysis or partial condensate of a silane compound having a hydrolyzable group is preferably used. Examples of the alkali metal compound include nitrates such as sodium, potassium and rubidium, sulfates, carbonates, oxides, nitrides, halides and hydroxides. As the pore forming material, polyalkylene glycol and its terminal alkylated product are preferably used. [Selection figure] None |