http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006285177-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-46 |
filingDate | 2005-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a187aa555fb12707f603e1fa9d5ce8a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c52dca95611a937f358b82c2d32e051 |
publicationDate | 2006-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2006285177-A |
titleOfInvention | Photosensitive composition and photosensitive film, and permanent pattern and method for forming the same |
abstract | [PROBLEMS] To reduce surface tackiness, good laminating and handling properties, excellent storage stability, high exposure sensitivity, can improve work efficiency by shortening development time, and have excellent chemical resistance after development. , A photosensitive composition that exhibits surface hardness, heat resistance, and the like, a photosensitive film using the same, a high-definition permanent pattern, and an efficient formation method thereof. A polymerizable functional group obtained by reacting at least one primary amine compound having a polymerizable group of 0.1 to 1.2 equivalents with respect to an anhydride group of a maleic anhydride copolymer. A copolymer having a group, (B) a compound in which an acid group for imparting an ethylenically unsaturated double bond and alkali developability to an epoxy compound is introduced, (C) a polymerizable compound, and (D) light. A photosensitive composition comprising at least a polymerization initiator, a photosensitive film using the same, a permanent pattern, and a method for forming the same. [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5091353-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101372116-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012125672-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8765831-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011026370-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011010457-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011010459-A1 |
priorityDate | 2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 731.