abstract |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus with improved plasma ignition performance and good startability. A reaction vessel 3 held on a reaction vessel support 2 by a holding jig 1, an ignition electrode 4 disposed at a position of the reaction vessel 3 held by the holding jig 1, and an inside of the reaction vessel 3 And a plasma generation electrode 6 for supplying power to the discharge space 5. By generating an ignition spark S between the ignition electrode 4 and the plasma generation electrode 6 to ignite the plasma P in the discharge space 5 and supplying electric power to the discharge space 5 ignited by the plasma P by the plasma generation electrode 6. The present invention relates to a plasma processing apparatus in which plasma P is continuously generated in a discharge space 5. The holding jig 1 is provided with a potential difference reduction preventing means 7 for preventing a potential difference between the plasma generating electrode 6 and the ignition electrode 4 from being reduced. [Selection] Figure 1 |