| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive paste having high accuracy and excellent curing depth. A photosensitive paste contains (A) inorganic fine particles, (B) an organic component containing a photopolymerizable compound, and (C) a compound represented by the general formula (1) as a photopolymerization initiator. Preferably, the photopolymerization initiator (C) is preferably 2-hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propeonyl) -benzyl] -phenyl} -2-methyl-propane. -1-one is used. Also, using such a photosensitive paste, a fired product pattern such as an electrode pattern, a black matrix pattern, and a partition wall pattern is formed. [Selection figure] None |