| abstract |
The present invention is capable of forming a high-sensitivity and high-definition pattern according to a mask design without generating scum (floating) on a pixel, and having excellent photosensitivity with a substrate. A coloring composition is provided. In a photosensitive coloring composition comprising a colorant, an alkali-soluble resin, a photopolymerization initiator, a reactive monomer, and an organic solvent as components, a fluorene structure-containing bifunctional monomer having a specific structure is used as the reactive monomer. . [Selection figure] None |