| abstract |
The present invention provides a color filter with little residue and few pattern defects, and a chemically amplified positive resist composition for color filters used in the production of the color filter. [Solution] [Wherein R 1 , R 2 and R 3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, etc., X represents O or NR (wherein R represents hydrogen A polymer having a group represented by the following: an atom, substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl), a compound capable of generating an acid upon irradiation with radiation, an organic solvent And a colorant. [Selection figure] None |