http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006227321-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2005-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b38d97198d9f9a833e9a7d5d538dd89d |
| publicationDate | 2006-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006227321-A |
| titleOfInvention | Positive resist composition and pattern forming method using the positive resist composition |
| abstract | A positive resist composition used in a semiconductor manufacturing process such as an IC, a circuit board such as a liquid crystal or a thermal head, and other photofabrication processes, and pattern formation using the positive resist composition The present invention provides a positive resist composition excellent in pattern collapse and line edge roughness, and a pattern forming method using the same. SOLUTION: (A) a cyclodextrin compound having a specific structure, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and (C) a monocyclic or polycyclic alicyclic hydrocarbon structure and / or a silicon atom. And a positive resist composition containing a resin that is decomposed by the action of an acid and has increased solubility in an alkaline developer, and a pattern forming method using the positive resist composition. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014066809-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010237563-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109765755-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013028744-A |
| priorityDate | 2005-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 172.