| abstract |
PROBLEM TO BE SOLVED: To provide a resist composition which is excellent in sensitivity and resolution and further suppresses surface roughness and outgassing. (A) A resist composition containing an acid generator represented by the following general formula (I), and a pattern forming method using the resist composition. [Chemical 1] In general formula (I), R represents an aliphatic group or an aromatic group which may have a hetero atom. S 1 to S 4 each independently represents an arbitrary substituent. n, m, l and k each independently represents an integer of 0 to 2. X represents an oxygen atom, a sulfur atom or a methylene group. Y represents an organic sulfonate anion. [Selection figure] None |