| abstract |
PROBLEM TO BE SOLVED: To provide an antireflection film excellent in scratch resistance and stain resistance. [Solution] On a substrate, A conductive layer formed by gas phase polymerization of monomers such as pyrrole and thiophene, and The following components (A) and (B1): (A) an ethylenically unsaturated group-containing fluoropolymer, (B1) Porous silica particles R 1 h SiX 4 comprising a hydrolyzate and / or hydrolysis condensate of a silicon compound represented by the following formulas (1) to (2) and having an average particle size of 5 to 50 nm. -H (1) R 2 j SiX 4-j (2) (R 1 is an alkyl group having 1 to 8 carbon atoms, X is independently an alkoxy group having 1 to 4 carbon atoms, h is an integer of 0 to 1. R 2 is an alkenyl group having 2 to 8 carbon atoms, An acryloxyalkyl group having 4 to 8 carbon atoms or a methacryloxyalkyl group having 5 to 8 carbon atoms, j represents an integer of 1 to 3). A low refractive index layer comprising a cured product of a curable resin composition containing An antireflective film. |