| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4903b7b4b84e3b845aef791cad8f2e97 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01L2300-0654
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01L2300-161
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-0378
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-0346
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-0325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01L2200-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2035-00158
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01L2300-0819 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-55
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01L3-5085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-253 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-00 |
| filingDate |
2005-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc2d1c011009506d02ae6f1f7c2ad8cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91a651227d841118ee23cca4e6e8468d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3bd34ab91616e460e76226ed127d56ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fc06592e37f755d986ad5a0c9a26c75 |
| publicationDate |
2006-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2006208240-A |
| titleOfInvention |
Optical measurement substrate and method of manufacturing the substrate |
| abstract |
PROBLEM TO BE SOLVED: To provide a substrate suitable for optical measurement which adheres and holds a minute amount of a specific substance in a minute region with high density and good reproducibility. Etching is performed by applying a masking pattern on a substrate using a material having a slightly weak adhesion to the substrate. Since the adhesive force between the mask and the substrate is weak, the mask 4 is peeled off from the substrate surface, and a gap 5 is formed between the mask 4 and the substrate 1 to perform anisotropic etching. According to such a method, it is possible to easily produce an optical measurement substrate having a concave shape whose cross-sectional shape can be approximated by a curve having an inflection point, and the measurement light is incident from a lower angle than 45 degrees obliquely. However, there is no loss of incident light and reflected light, and the optical characteristics of a very small amount of substance can be efficiently evaluated. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012127877-A |
| priorityDate |
2005-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |