| abstract |
PROBLEM TO BE SOLVED: To provide an etching solution and an etching method capable of etching a gold or gold alloy with a high etching rate, etching only gold or a gold alloy with high selectivity, and suppressing corrosion of other metal films. . [Solution] An etching solution for etching a thin film made of gold or an alloy containing gold formed on a substrate, the etching solution containing at least iodine, an iodine compound and a pH buffer, and having a pH in the range of 6 to 8, Etching method using this. [Selection] Figure 1 |