http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006189757-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2005-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4a9821905a4e646ca8b10e14ad88dce http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60ea28a01d4e427f5610acd2c434d8f1 |
| publicationDate | 2006-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006189757-A |
| titleOfInvention | Composition for photoresist pattern coating |
| abstract | A composition containing a water-soluble polymer which can be coated on a photoresist film and formed along the surface thereof, and a method for forming a photoresist pattern using the same are provided. More specifically, the present invention relates to a photoresist pattern coating composition and a pattern formation method using the same, and more particularly, the composition includes a compound containing a repeating unit of formula (1) and water, and is processed once after pattern formation. As a result, the size of the holes and margins can be effectively reduced, and therefore, it can be used for all semiconductor processes in which a fine pattern must be formed. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006323350-A |
| priorityDate | 2004-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 59.