http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006178004-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate | 2004-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf25699f936c429d2960c96b3d580863 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa2cb7c359542910a76240bf37ce8323 |
publicationDate | 2006-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2006178004-A |
titleOfInvention | Radiation-sensitive composition and method for producing electronic device using the same |
abstract | PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition capable of obtaining a high-resolution positive pattern with reduced edge roughness and a method for producing an electronic device using the same. SOLUTION: At least two or more polynuclear phenol compounds having 5 or more benzene rings, 5 or more hydroxyl groups and 2 or less hydroxyl groups in one benzene ring are bonded via an acid-decomposable group. A positive-type sensation in which the compound or resin having the above structure is the main component of the radiation-sensitive composition, and the purity of the polynuclear phenol compound is 90% or more in terms of the peak area corresponding to the main component measured by gel permeation chromatography. By using the radiation composition as a resist, a high-resolution positive pattern with reduced edge roughness is obtained. [Selection] Figure 3 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11720022-B2 |
priorityDate | 2004-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 78.