http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006173235-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
filingDate 2004-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ae27860c71559d83bcc45f7d3b66dd2
publicationDate 2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006173235-A
titleOfInvention Insulating layer forming method, heat treatment apparatus, and storage medium
abstract An insulating layer forming method capable of improving the throughput and further reducing the relative permittivity is provided. In a method of forming an insulating layer 88 in which minute pores 86 are dispersed on the surface of an object to be processed W, a single amount in which a hole forming material 84 is dispersed on the surface of the object to be processed. A coating film forming step of forming a coating film 82 containing a body or / and a low molecular weight organic compound, and a temperature within a first temperature zone in a processing container in which a plurality of objects to be processed can be heated vertically. A partial skeleton formation step of partially polymerizing the monomer or / and the low molecular weight organic compound to form a skeleton by heating for a predetermined time, and subsequently, in the processing vessel Holes for forming the insulating layer by heating the treatment body to a temperature in the second temperature band higher than the first temperature band and maintaining the treatment body for a predetermined time to vaporize the hole forming material and generate holes. Forming step. [Selection] Figure 4
priorityDate 2004-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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