| abstract |
Provided are a photosensitive resin composition that is cured by radiation, has excellent scratch resistance and abrasion resistance, has a low refractive index, and has a low reflectance when used in an antireflection film, and a film having a cured film thereof. To do. The following general formula (1) R f Si (OR 1 ) 3 ... Between the alkoxysilicon compounds having a fluorine atom represented by (1), or the alkoxysilicon compound having a fluorine atom represented by the general formula (1) and the following general formula (2) Fluorine atom-containing silicon compound obtained by condensing an alkoxysilicon compound having an epoxy group represented by R e Si (OR 2 ) 3 (2) in the presence of a basic catalyst ( A), a cationic photopolymerization initiator (B), a comb-shaped polymer (C) having a trunk portion made of a fluorine-based polymer and a branch portion made of silicone, and a polymer compound (D) having a fluorine atom. A photosensitive resin composition. [Selection figure] None |