abstract |
PROBLEM TO BE SOLVED: To provide a pattern forming material with improved optical characteristics, to suppress distortion of an image formed on the pattern forming material, and to form a permanent pattern such as a wiring pattern having no defect with high definition and efficiency. Providing a possible pattern forming apparatus and forming method. SOLUTION: A photosensitive layer is provided on a support having a synthetic resin film containing fine particles, and the total light transmittance when irradiating light with a wavelength of 405 nm is 80% or more, and the light to be irradiated is irradiated. A pattern forming material in which a diffusion angle, which is an angle formed by an optical axis and diffused light, is within 2 degrees, and the diffusion light energy is within 1% with respect to irradiation light energy at 1.5 degrees. is there. [Selection] Figure 1 |