http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006152301-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-02 |
filingDate | 2005-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87ff4090964c9d34f78d7ad60a0e27d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccc90cef43e01f47f5daf0b7c099c9cd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2d0a837c30b8c3eeaca97703cef6c1a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8442487dedc1b0ee92cb1df51113bc02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aeb4a733f07318fcb9d53dd0e6e47619 |
publicationDate | 2006-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2006152301-A |
titleOfInvention | Polymer film for hard mask made of tetrahedral carbon compound, method for producing the same, and method for forming fine pattern using the same |
abstract | PROBLEM TO BE SOLVED: To provide a polymer film for a hard mask having a new structure that can be used as a hard mask capable of effectively performing interlayer alignment by ensuring resistance to dry etching and reducing absorbance at a long wavelength. A polymer according to the sp 3 carbon main skeleton, CH n X 3 (4- n) reductive coupling reaction or CH n X 3 (4-n ) and a reducing cup R 1 X 4, Obtained by a ring reaction. The polymer film for the hard mask is obtained by curing at a temperature of 200 to 300 ° C. after forming the polymer film. R 1 is an aliphatic, alicyclic or aromatic group having the general formula of C n ′ H (2n ′ + 1) or C 6 H m R 2 (5-m) , and R 2 is a halogen atom , Hydroxy, nitrile, or carboxyl group, and X 3 and X 4 are F, Cl, Br, or I, respectively. [Selection] Figure 4A |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020051827-A |
priorityDate | 2004-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.